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| Ion Sources are proving to be an increasingly attractive proposition when used in thin film deposition and etching applications. The process benefits are numerous and are now well documented, but include substantial improvements in thin film quality, durability and adhesion. The precise anisotropic etching characteristics of a broad directed ion beam also offers many process benefits. |
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 Ion Beam Pre-Cleaning of Substrates |
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Ion Beam Pre-cleaning is an extremely effective and simple method of pre-cleaning substrates ‘in situ’ in the vacuum system. It is particularly effective when carried out immediately prior to deposition and has many advantages over other ‘in situ’ pre-cleaning techniques. |
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| Ion Beam Assisted Deposition (IBAD) |
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An ion source can be operated during a deposition process to provide extremely beneficial effects on thin film nucleation and packing density. However, the ion source used for this operation needs to have specific design and performance qualities in order to obtain optimum process results. |
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