EH 1000 Gridless Ion Source - Ion Beam Scientific


	EH 400

	EH 1000
		Technical Data
		Controller

	EH 2000

The EH 1000 delivers a broad divergent high current, low energy, ion beam of 30° half angle, (60° beam cone) and is compatible with a variety of inert or reactive gas species.

Provided with discrete 1-inch (or 32mm) dia. baseplate vacuum feedthroughs with shielded flexy leads for gas and power, suitable for remote mounting.
Complete with switch mode power supply, mass flow gas control and interconnecting cabling.
Straightforward installation in most deposition systems.
Removable anode module for ease of maintenance, and change of process.
Direct mounting option via UHV flange.
Optional universal mounting bracket with source angle adjustment.

Filament Version
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HCES (Filamentless) Version
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EH 1000 vs First Generation Ion Source

	EH 1000	First Generation Source
Anode Current	8 Amps	5 Amps
Beam Current	2000mA @ 8A	1000mA @ 5A
Anode Voltage	300 Volts max	170 Volts max
Beam Energy	35-210 eV	50-120eV
Divergence	60°	60°
Gas Flow	5-100 sccm	20-100 sccm
Pressure	0.5 to 4 x 10-4 Torr	1 to 4 x 10-4 Torr
Height	4” (100 mm)	7.5” (190mm)
Water Cooled Anode	Option	Option
HCES version	Option	Option

Ion Beam Profiles

Gas = Ar
Va = 150
la = 5 A
P = 1.5 x 10-4 torr
Td = 30cm (nom. throw distance)

Total Ion Beam Current
EH-1000 - 1340 mA
First Generation Source - 1052 mA

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