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| Our product range includes end-hall Gridless Ion Sources, permanent magnet Gridded Ion Sources and associated power supplies. All units are designed to be straightforward to retrofit into existing deposition systems, or to integrate as an accessory into a new deposition system. Applications include ion beam assisted deposition (IBAD) Ion beam substrate cleaning and diamond-like carbon coatings (DLC). |
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 Why Do I Need an Ion Source? |
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Ion sources have been available for many years, however it has been only relatively recently that the technology advanced sufficiently to enable their use as a powerful thin film process tool. |
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| A Brief History |
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From the development of the original end-hall design gridless ion source, why this technology needed to move forward to produce Next Generation ion sources. |
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| KRI™ EH 400 Compact Gridless Ion Source |
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The EH 400, being of physically compact design, is ideally suited for smaller deposition systems or installation where system baseplate space restrictions apply. |
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| KRI™ EH 1000 Gridless Ion Source |
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This next generation ion source range from Kaufman & Robinson Inc. inventors and owners of patented gridless end-hall technology, promises to become the new industry benchmark. Available in filament, hollow cathode (filamentless) and water-cooled versions, and with an impressive list of new design features. |
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| KRI™ EH 2000 High Output Gridless Ion Source |
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The EH 2000 represents the most powerful Gridless Ion Source in the product range and is capable of delivering an impressive 2.5 A of ion beam current over an ion energy range of 40 – 210 eV. Reactive gas compatible, and supplied with a hollow cathode with a lifetime of 400 – 1000 hours, it is the ultimate thin film process aid for the larger system. |
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| Ion Source Spares |
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Ionbeam Scientific volume manufacture spare parts to suit Commonwealth-Veeco Gridless Ion Sources at fiercely competitive prices. |
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