 |
| Ion Source Design and Ion Beam Technology are both complex and technically taxing subjects. To forward the understanding of these issues, we have introduced a section dedicated to relevant technical publications. |
 |
 |
 Ion Beam Technology - Technical Papers |
 |
Ion Source Design and Ion Beam Technology are both complex and technically taxing subjects. To forward the understanding of these issues, we have introduced a section dedicated to relevant technical publications. |
|
|
|
 |
| Preventing Veeco-Commonwealth MkII and MkII Gridless Ion Source Problems |
 |
Simple routine preventative maintenance procedures employed with MKI & MKII End-Hall Gridless Ion Sources can often prevent major failures of both ion source and power supply (controller) hence avoiding unnecessary loss of production downtime. The following points are intended as a guide. |
|
|
| What is a Kaufman Ion Source? |
 |
The Kaufman type Ion Source (frequently misspelled as Kaufmann or Kauffman) is commonly perceived as being a broad beam gridded ion source, typically used in thin film deposition and etching applications. However, Dr. Harold Kaufman has designed and patented many other ion sources including the original Commonwealth Scientific Corporation MKI, MKII, and MKIII gridless end-hall ion source. |
|
|
| What is an End Hall Gridless Ion Source? |
|
The End-Hall Gridless Ion Source is a high current ion source capable of producing high ion current output at low ion energies. Less commonly known, is that the End-Hall Gridless Ion Sources are also Kaufman designed. These include the original Commonwealth Scientific Corporation MKI. MKII and MKIII Ion Sources. These units had become an industry standard for ophthalmic and technical optical coating operations, with well over 1000 installations in routine use worldwide. Now the latest designs offer significant performance advantages. |
|
|
