An ion source is an extremely versatile process aid to a thin film deposition system. Unlike conventional higher-pressure glow discharge and plasma processes, which suffer from plasma spread, the ion source provides a confined and directed plasma to the substrate, at low pressure, with controlled ion current and energy.

Ion Beam Cleaning

In-situ substrate precleaning can therefore be carried out at low pressure immediately prior to deposition. As the operational pressure is compatible with electron beam evaporation, the deposition process may be ‘phased in’ without halting the ion beam cleaning process, hence providing a resultant improvement in film adhesion.

Ion Beam Assisted Deposition (IBAD)

Additionally, the source can be operated during the deposition process to provide beneficial effects in thin film nucleation and packing density. In many instances, the need for substrate heating can be eliminated, or process temperatures can be significantly reduced, permitting coatings on delicate substrates such as plastics and also reducing system cycle time.

Ophthalmic Coating

Not surprisingly, the ion source has found much favour in the ophthalmic coating industry. It is also common for users to report that they consider the ion source to be of equal process importance to the e-beam evaporation source installed in their deposition system.

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